{"guid":"8f3ef0f5-4929-48b1-87b7-781245aae7ac","title":"I could not resist","subtitle":"Resists for Electron Beam Lithography (EBL)","slug":"rc3-11364-i_could_not_resist","link":"https://fahrplan.events.ccc.de/rc3/2020/Fahrplan/events/11364.html","description":"Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering.\nWe will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers.\n\n\u003c!DOCTYPE html\u003e\n\u003chtml\u003e\n\u003cbody\u003e\n\u003ch2\u003eResists? What\u0026apos;s that?\u003c/h2\u003e\n\u003cul\u003e\n    \u003cli\u003eWhat are their applications\u003c/li\u003e\n    \u003cli\u003eHow does it work (types (positive/negative), chemistry, proximity effect, dosage etc)\u003c/li\u003e\n\u003c/ul\u003e\n\n\u003ch2\u003eEBL? What\u0026apos;s that?\u003c/h2\u003e\n\u003cul\u003e\n    \u003cli\u003eHow does it work\u003c/li\u003e\n    \u003cli\u003ePros \u0026amp; cons:  comparison between EBL (slow) photolithography (fast)\u003c/li\u003e\n    \u003cli\u003eWhich resist can I use for EBL\u003c/li\u003e\n\u003c/ul\u003e\n\n\u003ch2\u003eDIY cooking of PMMA based resists\u003c/h2\u003e\n\u003cul\u003e\n    \u003cli\u003eComparison of different solvents\u003c/li\u003e\n\u003c/ul\u003e\n\n\u003ch2\u003eComposition of different developers\u003c/h2\u003e\n\u003cul\u003e\n    \u003cli\u003eComparison of different developers\u003c/li\u003e\n\u003c/ul\u003e\n\n\u003ch2\u003eApplications\u003c/h2\u003e\n\u003cul\u003e\n    \u003cli\u003eUsage as a mask\u003c/li\u003e\n    \u003cli\u003eUsage as a structural dielectric material\u003c/li\u003e\n    \u003cli\u003e ...(?)\u003c/li\u003e\n\u003c/ul\u003e\n\u003ch2\u003eThe EBL exposure process\u003c/h2\u003e\n\u003cul\u003e\n    \u003cli\u003esimple SEM retrofitted with an EBL controller\u003c/li\u003e\n    \u003cli\u003eThe common file formats (GDSII \u0026amp; OASIS)\u003c/li\u003e\n    \u003cli\u003eScan-Gen: how to generate the proper curves for the exposure\u003c/li\u003e\n    \u003cli\u003eHardware: off-the-shelf embedded modules like the RedPitaya\u003c/li\u003e\n    \u003cli\u003eGeneration of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage!\u003c/li\u003e\n    \u003cli\u003eFiducial detection and alignment for multi-pass/multi-layer processes\u003c/li\u003e\n\u003c/ul\u003e\n\u003ch2\u003eStuff comes together\u003c/h2\u003e\n\u003cul\u003e\n    \u003cli\u003ewalk through the complete process along a simple example\u003c/li\u003e\n\u003c/ul\u003e\n\n\u003ch2\u003eMore Examples\u003c/h2\u003e\n\n\u003ch2\u003eThanks \u0026 Credits\u003c/h2\u003e\n\n\u003ch2\u003eQ \u0026 A\u003c/h2\u003e\n\n\u003c/body\u003e\n\u003c/html\u003e\n","original_language":"eng","persons":["N00DL3"],"tags":["rc3-mcr","11364","2020","Hardware \u0026 Making","main"],"view_count":386,"promoted":false,"date":"2020-12-30T14:00:00.000+01:00","release_date":"2020-12-31T00:00:00.000+01:00","updated_at":"2025-05-23T18:15:04.864+02:00","length":1691,"duration":1691,"thumb_url":"https://static.media.ccc.de/media/events/rc3/11364-8f3ef0f5-4929-48b1-87b7-781245aae7ac.jpg","poster_url":"https://static.media.ccc.de/media/events/rc3/11364-8f3ef0f5-4929-48b1-87b7-781245aae7ac_preview.jpg","timeline_url":"https://static.media.ccc.de/media/events/rc3/11364-8f3ef0f5-4929-48b1-87b7-781245aae7ac.timeline.jpg","thumbnails_url":"https://static.media.ccc.de/media/events/rc3/11364-8f3ef0f5-4929-48b1-87b7-781245aae7ac.thumbnails.vtt","frontend_link":"https://media.ccc.de/v/rc3-11364-i_could_not_resist","url":"https://api.media.ccc.de/public/events/8f3ef0f5-4929-48b1-87b7-781245aae7ac","conference_title":"Remote Chaos 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